Applied Materials 0041-12156

Product Description

0041-12156 is a 300mm Radiance Plus Inject Reflector Plate manufactured by Applied Materials. It is a large circular precision plate installed inside the thermal processing chamber, used to reflect infrared radiant heat for wafer temperature control during rapid thermal processing (RTP).

Product Functions

• Reflect infrared lamp radiation to achieve uniform heat distribution across the 300mm wafer surface.
• Maintain precise and homogeneous wafer temperature for thermal annealing, spike anneal and thermal treatment processes.
• Features precision gas injection orifices to deliver process gas evenly into the reaction zone.
• Provides stable thermal boundary to reduce heat loss and improve repeatability of thermal recipes.

Application Scenarios

• Applied Materials Radiance Plus RTP (Rapid Thermal Processing) system for 300mm wafers.
• Semiconductor front-end fab for ion implant annealing, dopant activation and thermal oxidation processes.
• Advanced logic and memory chip manufacturing requiring ultra-precise thermal control.

Frequently Asked Issues

• Surface coating degradation: High-temperature cycling causes reflector surface discoloration and reduced reflectivity, leading to wafer temperature non-uniformity.
• Orifice clogging: Deposition of process byproducts blocks gas holes, resulting in uneven gas flow and process drift.
• Edge corrosion: Chemical attack from process gases occurs around mounting holes and plate edges.
• Thermal warpage: Long-term high heat exposure induces plate distortion, affecting thermal uniformity and wafer temperature measurement accuracy.