Applied Materials 0041-39086

Product Description

0041-39086 is a high-temperature reflector assembly for Applied Materials Radiance RTP (Rapid Thermal Processing) chamber for 300mm wafers. It is a precision optical reflector component with high-reflectivity coating, installed inside vacuum thermal chamber to control infrared light path during rapid thermal annealing.

Product Functions

• Reflect infrared radiation from heating lamps to deliver uniform thermal distribution over the full 300mm wafer surface.
• Shape IR light path to achieve precise and repeatable temperature control for spike anneal and dopant activation recipes.
• Reduce radiative heat loss inside the chamber to improve thermal efficiency and stabilize process performance.
• Withstand repeated rapid thermal shock and vacuum cycling while maintaining optical reflectivity during mass production.

Application Scenarios

• Applied Materials Radiance series RTP rapid thermal processing platform for 300mm wafer.
• Semiconductor front-end fabs for ion implantation annealing and advanced thermal treatment processes.
• Advanced logic and memory chip manufacturing requiring ultra-fast high-temperature spike annealing.

Frequently Asked Issues

• Reflectivity degradation: Long-term high temperature exposure causes coating discoloration, leading to wafer temperature non-uniformity and recipe drift.
• Thermal warpage: Repeated fast heating and cooling cycles induce plate deformation and alter infrared reflection geometry.
• Particle contamination: Accumulated process byproducts peel off and generate particles, resulting in wafer surface defects.
• Coating delamination: Thermal stress causes reflective coating peeling, requiring reflector assembly replacement.